Publikationen (40) Publikationen von DANIEL ALVAREZ LORENZO

2023

  1. Computational modeling of membrane trafficking processes: From large molecular assemblies to chemical specificity

    Current Opinion in Cell Biology, Vol. 83

2022

  1. Computational Design of Rhenium(I) Carbonyl Complexes for Anticancer Photodynamic Therapy

    Inorganic Chemistry, Vol. 61, Núm. 1, pp. 439-455

  2. Experimental and theoretical determination of the role of ions in atomic layer annealing

    Journal of Materials Chemistry C, Vol. 10, Núm. 14, pp. 5707-5715

  3. Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2fabricated using anhydrous H2O2as the ALD oxidant

    Applied Physics Letters, Vol. 121, Núm. 22

2021

  1. Low Resistivity Titanium Nitride Thin Film Fabricated by Atomic Layer Deposition on Silicon

    2021 IEEE International Interconnect Technology Conference, IITC 2021

  2. Tris(dimethylamido)aluminum(III) and N2H4: Ideal precursors for the low-temperature deposition of large grain, oriented c-axis AlN on Si via atomic layer annealing

    Applied Surface Science, Vol. 554

2020

  1. Addition of Re-Bonded Nucleophilic Ligands to Activated Alkynes: A Theoretical Rationalization

    European Journal of Inorganic Chemistry, Vol. 2020, Núm. 3, pp. 269-280

  2. Catalytic hydration of cyanamides with phosphinous acid-based ruthenium(ii) and osmium(ii) complexes: scope and mechanistic insights

    Catalysis Science and Technology, Vol. 10, Núm. 12, pp. 4084-4098

  3. Deposition of High Thermal Conductivity AlN Heat Spreader Films

    2020 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA 2020

  4. Influence of the nucleophilic ligand on the reactivity of carbonyl rhenium(I) complexes towards methyl propiolate: A computational chemistry perspective

    Molecules, Vol. 25, Núm. 18

  5. Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source

    Materials, Vol. 13, Núm. 15, pp. 1-10

  6. Nomograms for morbidity and mortality after oncologic colon resection in the enhanced recovery era: results from a multicentric prospective national study

    International Journal of Colorectal Disease, Vol. 35, Núm. 12, pp. 2227-2238

  7. Sacrificial hardmask ALD with hydrogen peroxide: Comparative study of low temperature growth and film characteristics for TiO2 and Al2O3

    Proceedings of SPIE - The International Society for Optical Engineering

2019

  1. Assessment of BODIPY-Oxasmaragdyrin Dyads for Dye-Sensitized Solar Cells: Aromaticity, Photosensitization Capability, and Charge Transport

    Journal of Physical Chemistry C, Vol. 123, Núm. 32, pp. 19362-19375

  2. Regiochemistry Control by Bipyridine Substituents in the Deprotonation of ReI and MoII N-Alkylimidazole Complexes

    Chemistry - A European Journal, Vol. 25, Núm. 39, pp. 9253-9265

  3. Vapor-phase surface cleaning of electroplated Cu films using anhydrous N2H4

    ECS Transactions

  4. [Cp2Mo(OH)(OH2)]+-Catalyzed Hydrolysis of Mono- and Difunctional Ethers: Theoretical Understanding of Their Divergent Reactivity

    European Journal of Inorganic Chemistry, Vol. 2019, Núm. 24, pp. 2924-2932

2018

  1. Low temperature thermal ALD TaN x and TiN x films from anhydrous N 2 H 4

    Applied Surface Science, Vol. 462, pp. 1029-1035

  2. Low-temperature amorphous boron nitride on Si 0.7 Ge 0.3 (001), Cu, and HOPG from sequential exposures of N 2 H 4 and BCl 3

    Applied Surface Science, Vol. 439, pp. 689-696

2017

  1. Insights on the Reactivity of Terminal Phosphanido Metal Complexes toward Activated Alkynes from Theoretical Computations

    Inorganic Chemistry, Vol. 56, Núm. 11, pp. 6652-6661