DANIEL
ALVAREZ LORENZO
Investigador
Publicaciones (42) Publicaciones de DANIEL ALVAREZ LORENZO Ver datos de investigación referenciados.
2024
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The conformational plasticity of structurally unrelated lipid transport proteins correlates with their mode of action
PLoS Biology, Vol. 22, Núm. 8
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Yop1 stability and membrane curvature generation propensity are controlled by its oligomerisation interface
The Biochemical journal, Vol. 481, Núm. 20, pp. 1437-1448
2023
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Computational modeling of membrane trafficking processes: From large molecular assemblies to chemical specificity
Current Opinion in Cell Biology, Vol. 83
2022
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Computational Design of Rhenium(I) Carbonyl Complexes for Anticancer Photodynamic Therapy
Inorganic Chemistry, Vol. 61, Núm. 1, pp. 439-455
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Experimental and theoretical determination of the role of ions in atomic layer annealing
Journal of Materials Chemistry C, Vol. 10, Núm. 14, pp. 5707-5715
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Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2fabricated using anhydrous H2O2as the ALD oxidant
Applied Physics Letters, Vol. 121, Núm. 22
2021
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Low Resistivity Titanium Nitride Thin Film Fabricated by Atomic Layer Deposition on Silicon
2021 IEEE International Interconnect Technology Conference, IITC 2021
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Tris(dimethylamido)aluminum(III) and N2H4: Ideal precursors for the low-temperature deposition of large grain, oriented c-axis AlN on Si via atomic layer annealing
Applied Surface Science, Vol. 554
2020
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Addition of Re-Bonded Nucleophilic Ligands to Activated Alkynes: A Theoretical Rationalization
European Journal of Inorganic Chemistry, Vol. 2020, Núm. 3, pp. 269-280
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Catalytic hydration of cyanamides with phosphinous acid-based ruthenium(ii) and osmium(ii) complexes: scope and mechanistic insights
Catalysis Science and Technology, Vol. 10, Núm. 12, pp. 4084-4098
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Deposition of High Thermal Conductivity AlN Heat Spreader Films
2020 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA 2020
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Influence of the nucleophilic ligand on the reactivity of carbonyl rhenium(I) complexes towards methyl propiolate: A computational chemistry perspective
Molecules, Vol. 25, Núm. 18
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Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source
Materials, Vol. 13, Núm. 15, pp. 1-10
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Nomograms for morbidity and mortality after oncologic colon resection in the enhanced recovery era: results from a multicentric prospective national study
International Journal of Colorectal Disease, Vol. 35, Núm. 12, pp. 2227-2238
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Sacrificial hardmask ALD with hydrogen peroxide: Comparative study of low temperature growth and film characteristics for TiO2 and Al2O3
Proceedings of SPIE - The International Society for Optical Engineering
2019
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Assessment of BODIPY-Oxasmaragdyrin Dyads for Dye-Sensitized Solar Cells: Aromaticity, Photosensitization Capability, and Charge Transport
Journal of Physical Chemistry C, Vol. 123, Núm. 32, pp. 19362-19375
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Regiochemistry Control by Bipyridine Substituents in the Deprotonation of ReI and MoII N-Alkylimidazole Complexes
Chemistry - A European Journal, Vol. 25, Núm. 39, pp. 9253-9265
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Vapor-phase surface cleaning of electroplated Cu films using anhydrous N2H4
ECS Transactions
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[Cp2Mo(OH)(OH2)]+-Catalyzed Hydrolysis of Mono- and Difunctional Ethers: Theoretical Understanding of Their Divergent Reactivity
European Journal of Inorganic Chemistry, Vol. 2019, Núm. 24, pp. 2924-2932
2018
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Low temperature thermal ALD TaN x and TiN x films from anhydrous N 2 H 4
Applied Surface Science, Vol. 462, pp. 1029-1035