Low-temperature amorphous boron nitride on Si 0.7 Ge 0.3 (001), Cu, and HOPG from sequential exposures of N 2 H 4 and BCl 3

1. Wolf, S.
2. Edmonds, M.
3. Sardashti, K.
4. Clemons, M.
5. Park, J.H.
6. Yoshida, N.
7. Dong, L.
8. Nemani, S.
9. Yieh, E.
10. Holmes, R.
11. Alvarez, D.
12. Kummel, A.C.