Publicacions en col·laboració amb investigadors/es de University of California, San Diego (11)

2022

  1. Experimental and theoretical determination of the role of ions in atomic layer annealing

    Journal of Materials Chemistry C, Vol. 10, Núm. 14, pp. 5707-5715

2021

  1. Low Resistivity Titanium Nitride Thin Film Fabricated by Atomic Layer Deposition on Silicon

    2021 IEEE International Interconnect Technology Conference, IITC 2021

  2. Tris(dimethylamido)aluminum(III) and N2H4: Ideal precursors for the low-temperature deposition of large grain, oriented c-axis AlN on Si via atomic layer annealing

    Applied Surface Science, Vol. 554

2020

  1. Deposition of High Thermal Conductivity AlN Heat Spreader Films

    2020 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA 2020

2018

  1. Low temperature thermal ALD TaN x and TiN x films from anhydrous N 2 H 4

    Applied Surface Science, Vol. 462, pp. 1029-1035

  2. Low-temperature amorphous boron nitride on Si 0.7 Ge 0.3 (001), Cu, and HOPG from sequential exposures of N 2 H 4 and BCl 3

    Applied Surface Science, Vol. 439, pp. 689-696

2017

  1. Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1− x(001) and SixGe1− x(110)

    Journal of Chemical Physics, Vol. 146, Núm. 5

  2. Self-limiting CVD of a passivating SiOx control layer on InGaAs(001)-(2x4) with the prevention of III-V oxidation

    Surface Science, Vol. 660, pp. 31-38

2016

  1. Surface passivation of new channel materials utilizing hydrogen peroxide and hydrazine gas

    Solid State Phenomena

2007

  1. Pyrazole complexes as anion receptors: Effects of changing the metal, the pyrazole substitution pattern, and the number of pyrazole ligands

    Inorganic Chemistry, Vol. 46, Núm. 8, pp. 3407-3418

1998

  1. Exposure of Inert Gas Purifiers to Air: Studies on Hydrocarbon Release in Resin-Based vs. Nickel-Based Purifiers

    Journal of the IEST, Vol. 41, Núm. 6, pp. 26-33