José María Sanz-rekin lankidetzan egindako argitalpenak (26)

2006

  1. Electron inelastic mean free path and dielectric properties of a -boron, a -carbon, and their nitrides as determined by quantitative analysis of reflection electron energy loss spectroscopy

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 24, Núm. 3, pp. 396-407

2004

  1. Quantitative REELS of amorphous carbon and carbon nitride films

    Surface and Interface Analysis

2002

  1. Electronic structure of TiO2 monolayers grown on Al2O3 and MgO studied by resonant photoemission spectroscopy

    Surface Science

  2. Factor analysis applied to the study of valence band resonant photoemission spectra in transition-metal compounds

    Surface and Interface Analysis

2001

  1. Electronic interaction at the TiO2-Al2O3 interface as observed by X-ray absorption spectroscopy

    Surface Science

  2. Resonant photoemission and X-ray absorption study of electronic structure of the TiO2-Al2O3 interface

    Langmuir, Vol. 17, Núm. 23, pp. 7339-7343

  3. Resonant photoemission of TiN films

    Physical Review B - Condensed Matter and Materials Physics, Vol. 63, Núm. 7

2000

  1. BN and ZrN AES Spectra Obtained by Depth Profiling of ZrN/BN Multilayers

    Surface Science Spectra, Vol. 7, Núm. 2, pp. 86-92

  2. Bonding and morphology study of carbon nitride films obtained by dual ion beam sputtering

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 18, Núm. 2, pp. 515-523

  3. Correlation between N1 s core level x-ray photoelectron and x-ray absorption spectra of amorphous carbon nitride films

    Applied Physics Letters, Vol. 77, Núm. 6, pp. 803-805

  4. Correlation between bonding structure and mechanical properties of amorphous carbon nitride thin films

    Surface and Coatings Technology

  5. Crystal-field effects at the TiO2-SiO2 interface as observed by X-ray absorption spectroscopy

    Langmuir, Vol. 16, Núm. 17, pp. 7066-7069

  6. Determination of resputtering yields in carbon nitride films grown by dual ion beam sputtering

    Surface and Coatings Technology, Vol. 125, Núm. 1-3, pp. 366-370

  7. Friction measurements of CNx and TiCxNy films by scanning force microscopy

    Surface and Interface Analysis, Vol. 30, Núm. 1, pp. 638-642

1999

  1. Combination of specular and off-specular low-angle X-ray diffraction in the study of Co/Cu multilayers: Mesoscopic structure and layer oxidation

    Surface and Interface Analysis, Vol. 27, Núm. 1, pp. 1-7

  2. Dielectric properties of Ti, TiO2 and TiN from 1.5 to 60 eV determined by reflection electron energy loss spectroscopy (REELS) and ellipsometry

    Physica Status Solidi (A) Applied Research, Vol. 175, Núm. 1, pp. 429-436

  3. Oxidation study of Co/Cu multilayers by resonant X-ray reflectivity

    Vacuum, Vol. 52, Núm. 1-2, pp. 109-113

  4. The role of CN chemical bonding on the tribological behaviour of CNx coatings

    Surface and Coatings Technology, Vol. 120-121, pp. 594-600

  5. Tribological and chemical characterization of ion beam-deposited CNx films

    Vacuum, Vol. 52, Núm. 1-2, pp. 199-202

1998

  1. Combination of specular and off-specular low-angle X-ray diffraction in the study of metallic multilayers

    Solid State Communications, Vol. 108, Núm. 10, pp. 769-773