Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source

1. Jung, Y.C.
2. Hwang, S.M.
3. Le, D.N.
4. Kondusamy, A.L.N.
5. Mohan, J.
6. Kim, S.W.
7. Kim, J.H.
8. Lucero, A.T.
9. Ravichandran, A.
10. Kim, H.S.
11. Kim, S.J.
12. Choi, R.
13. Ahn, J.
14. Alvarez, D.
15. Spiegelman, J.
16. Kim, J.

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DOI: 10.3390/MA13153387 GOOGLE SCHOLAR lock_openOpen access editor

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