Publicaciones en colaboración con investigadores/as de Horiba (France) (15)

2012

  1. Analysis of thin and thick Films

    Mass Spectrometry Handbook (John Wiley and Sons), pp. 943-959

2011

  1. A purged argon pre-chamber for analytical glow discharge - Time of flight mass spectrometry applications

    Journal of Analytical Atomic Spectrometry, Vol. 26, Núm. 4, pp. 798-803

2010

  1. Direct chemical in-depth profile analysis and thickness quantification of nanometer multilayers using pulsed-rf-GD-TOFMS

    Analytical and Bioanalytical Chemistry, Vol. 396, Núm. 8, pp. 2881-2887

  2. Polymer screening by radiofrequency glow discharge time-of-flight mass spectrometry

    Analytical and Bioanalytical Chemistry, Vol. 396, Núm. 8, pp. 2863-2869

  3. Quantitative depth profile analysis of boron implanted silicon by pulsed radiofrequency glow discharge time-of-flight mass spectrometry

    Solar Energy Materials and Solar Cells, Vol. 94, Núm. 8, pp. 1352-1357

2009

  1. 18O/16O isotopic separation in anodic tantala films by glow discharge time-of-flightmass spectrometry

    Surface and Interface Analysis, Vol. 41, Núm. 12-13, pp. 966-973

  2. A comparison of non-pulsed radiofrequency and pulsed radiofrequency glow discharge orthogonal time-of-flight mass spectrometry for analytical purposes

    Journal of Analytical Atomic Spectrometry, Vol. 24, Núm. 10, pp. 1373-1381

  3. Analysis of small bubbles in glass by glow discharge-Time-of-flight mass spectrometry

    Analytica Chimica Acta, Vol. 652, Núm. 1-2, pp. 272-277

  4. Pulsed radiofrequency glow discharge time-of-flight mass spectrometry for molecular depth profiling of polymer-based films

    Rapid Communications in Mass Spectrometry, Vol. 23, Núm. 5, pp. 549-556

  5. Radiofrequency glow discharge time of flight mass spectrometry for thin films analysis: Pulsed mode versus continuous mode

    Yejin Fenxi/Metallurgical Analysis, Vol. 29, Núm. 11, pp. 1-7

  6. Spectroscopic evaluation of a compact magnetically boosted radiofrequency glow discharge for time-of-flight mass spectrometry

    Analytical and Bioanalytical Chemistry, Vol. 394, Núm. 1, pp. 373-382

  7. The concept of plasma cleaning in glow discharge spectrometry

    Journal of Analytical Atomic Spectrometry, Vol. 24, Núm. 6, pp. 734-741

  8. The effect of glow discharge sputtering on the analysis of metal oxide films

    Spectrochimica Acta - Part B Atomic Spectroscopy, Vol. 64, Núm. 2, pp. 155-166

2008

  1. In-depth profile analysis of oxide films by radiofrequency glow discharge optical emission spectrometry (rf-GD-OES): Possibilities of depth-resolved solid-state speciation

    Journal of Analytical Atomic Spectrometry, Vol. 23, Núm. 10, pp. 1378-1387

  2. Pulsed radiofrequency glow discharge time of flight mass spectrometer for the direct analysis of bulk and thin coated glasses

    Journal of Analytical Atomic Spectrometry, Vol. 23, Núm. 9, pp. 1239-1246