Publicaciones en colaboración con investigadores/as de University of Texas at Dallas (4)

2022

  1. Experimental and theoretical determination of the role of ions in atomic layer annealing

    Journal of Materials Chemistry C, Vol. 10, Núm. 14, pp. 5707-5715

  2. Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2fabricated using anhydrous H2O2as the ALD oxidant

    Applied Physics Letters, Vol. 121, Núm. 22

2020

  1. Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source

    Materials, Vol. 13, Núm. 15, pp. 1-10

2019

  1. Vapor-phase surface cleaning of electroplated Cu films using anhydrous N2H4

    ECS Transactions