2012

1. Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry

   Analytica Chimica Acta, Vol. 714, pp. 1-7

2. Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas

   Journal of Analytical Atomic Spectrometry, Vol. 27, Núm. 1, pp. 71-79