Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas
- Sánchez, P.
- Alberts, D.
- Fernández, B.
- Menéndez, A.
- Pereiro, R.
- Sanz-Medel, A.
ISSN: 0267-9477, 1364-5544
Year of publication: 2012
Volume: 27
Issue: 1
Pages: 71-79
Type: Article