Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas

  1. Sánchez, P.
  2. Alberts, D.
  3. Fernández, B.
  4. Menéndez, A.
  5. Pereiro, R.
  6. Sanz-Medel, A.
Journal:
Journal of Analytical Atomic Spectrometry

ISSN: 0267-9477 1364-5544

Year of publication: 2012

Volume: 27

Issue: 1

Pages: 71-79

Type: Article

DOI: 10.1039/C1JA10235D GOOGLE SCHOLAR

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