New vaporization sources for H2O2 for pre-treatment/cleaning of ALD deposition surfaces

  1. Alvarez, D.
  2. Heinlein, E.
  3. Holmes, R.J.
  4. Arya, B.
  5. Shon-Roy, L.
  6. Spiegelman, J.
Aktak:
ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

ISSN: 1078-8743

ISBN: 9781467350068

Argitalpen urtea: 2013

Orrialdeak: 159-162

Mota: Biltzar ekarpena

DOI: 10.1109/ASMC.2013.6552788 GOOGLE SCHOLAR
Datuen iturria: Scopus