Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1− x(001) and SixGe1− x(110)
- Edmonds, M.
- Sardashti, K.
- Wolf, S.
- Chagarov, E.
- Clemons, M.
- Kent, T.
- Park, J.H.
- Tang, K.
- McIntyre, P.C.
- Yoshida, N.
- Dong, L.
- Holmes, R.
- Alvarez, D.
- Kummel, A.C.
Aldizkaria:
Journal of Chemical Physics
ISSN: 0021-9606
Argitalpen urtea: 2017
Alea: 146
Zenbakia: 5
Mota: Artikulua