Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1− x(001) and SixGe1− x(110)

  1. Edmonds, M.
  2. Sardashti, K.
  3. Wolf, S.
  4. Chagarov, E.
  5. Clemons, M.
  6. Kent, T.
  7. Park, J.H.
  8. Tang, K.
  9. McIntyre, P.C.
  10. Yoshida, N.
  11. Dong, L.
  12. Holmes, R.
  13. Alvarez, D.
  14. Kummel, A.C.
Journal:
Journal of Chemical Physics

ISSN: 0021-9606

Year of publication: 2017

Volume: 146

Issue: 5

Type: Article

DOI: 10.1063/1.4975081 GOOGLE SCHOLAR