Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy

  1. Hermosa, J.
  2. Hierro-Rodríguez, A.
  3. Quirós, C.
  4. Vélez, M.
  5. Sorrentino, A.
  6. Aballe, L.
  7. Pereiro, E.
  8. Ferrer, S.
  9. Martín, J.I.
Revue:
Micromachines

ISSN: 2072-666X

Année de publication: 2022

Volumen: 13

Número: 2

Type: Article

DOI: 10.3390/MI13020204 GOOGLE SCHOLAR lock_openAccès ouvert editor