Sacrificial hardmask ALD with hydrogen peroxide: Comparative study of low temperature growth and film characteristics for TiO2 and Al2O3

  1. Alvarez, D.
  2. Andachi, K.
  3. Tsuchibuchi, G.
  4. Suzuki, K.
  5. Spiegelman, J.
Proceedings:
Proceedings of SPIE - The International Society for Optical Engineering

ISSN: 1996-756X,  0277-786X

ISBN: 9781510634190

Year of publication: 2020

Volume: 11326

Type: Conference paper

DOI: 10.1117/12.2551699 GOOGLE SCHOLAR
Data source: Scopus