Quantitative depth profiling of boron and arsenic ultra low energy implants by pulsed rf-GD-ToFMS

  1. Lobo, L.
  2. Fernández, B.
  3. Pereiro, R.
  4. Bordel, N.
  5. Demenev, E.
  6. Giubertoni, D.
  7. Bersani, M.
  8. Hönicke, P.
  9. Beckhoff, B.
  10. Sanz-Medel, A.
Journal:
Journal of Analytical Atomic Spectrometry

ISSN: 0267-9477,  1364-5544

Year of publication: 2011

Volume: 26

Issue: 3

Pages: 542-549

Type: Article

DOI: 10.1039/C0JA00197J GOOGLE SCHOLAR

Sustainable development goals

Data source: Scopus