Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas

1. Sánchez, P.
2. Alberts, D.
3. Fernández, B.
4. Menéndez, A.
5. Pereiro, R.
6. Sanz-Medel, A.